SDK to Strengthen Electronic Cleaning Agent Business - building High-Purity Cyclohexanone Plant in China
Showa Denko K.K. (SDK) will start commercial production of high-purity cyclohexanone in Zhejiang Province, China in August 2010, building a 5,000 t/y plant at Zhejiang Quzhou Juhua Showa Electronic Chemical Materials Co., Ltd., a joint venture company in which SDK owns a 51% share.
High-purity cyclohexanone is used as cleaning agent for removal of photoresist1 and as solvent for photoresist2 in the production of semiconductors and liquid crystal display (LCD) panels. The new plant will receive raw material cyclohexanone from the joint venture partner Juhua Group Corporation, and produce high-purity cyclohexanone utilizing SDK’s proprietary purification technology. With the construction of the new plant in China, SDK will ensure stable supply of high-quality high-purity cyclohexanone.
Reflecting the trend toward production of electronic circuits with extremely small line widths, demand for high-quality high-purity cyclohexanone is expected to grow as cleaning agent for removal of photoresist. Demand will also grow for use as solvent for photoresist, due to increased production of LCD panels in China. Thus, SDK is establishing an integrated purification/marketing setup to ensure stable supply of the product, while providing its purification technology and quality assurance system to the joint venture in China.
SDK is already providing various industries with inorganic/organic cleaning agents (trade name: Solfine™) produced at its Tokuyama Plant in Shunan City, Yamaguchi Prefecture, Japan and its subsidiary Taiwan Showa Chemicals Manufacturing Co., Ltd. in Tainan City, Taiwan. With the establishment of the high-purity cyclohexanone supply setup in China, SDK will strengthen its SolfineTM business for electronics applications and serve the needs of the rapidly growing electronics industry in Asia.
1 Cleaning agent for removal of photoresist: “Photoresist” refers to a light- or electron-beam-sensitive composition that is applied to a substrate, exposed, and developed for the purpose of forming electronic circuits on the substrate. In the manufacturing process, cleaning is required to remove unexposed portion of photoresist.
2 Solvent for photoresist: By dissolving photoresist in solvent, it becomes possible to adjust the concentration of photoresist to specific levels.
Solfine™ series cleaning agents